Nikon Unveils the Litho Booster 1000: A Next-Generation Alignment Station Aimed at Unmatched Overlay Precision for Cutting-Edge 3D Devices | News
Tokyo — Nikon Corporation announced the development of the Litho Booster 1000, its newest alignment station model crafted to deliver exceptional overlay accuracy in semiconductor manufacturing. The Litho Booster 1000 enables dense sampling measurements on every wafer and transmits precise correction data forward to the lithography system prior to exposure, enhancing process control and boosting production yield. Nikon plans to roll out the system in the second half of 2026.
Built for maximum adaptability, the Litho Booster 1000 is compatible with semiconductor lithography systems from Nikon as well as other lithography equipment suppliers. Since 2018, Nikon has provided alignment station technology tailored to meet customers’ overlay requirements; the new model marks a significant advancement in capability and performance.
As 3D device structures gain rapid traction across multiple semiconductor segments—including CMOS image sensors, logic devices, NAND flash, and soon DRAM—the industry confronts rising overlay challenges driven by wafer deformation and misalignment during multi-layer processing and wafer-to-wafer bonding. These steps necessitate higher-density, more precise wafer measurements to sustain tight overlay tolerances across increasingly complex stacks.
The Litho Booster 1000 tackles these challenges through enhanced multi-point and absolute measurement accuracy, yielding improved device quality and yield while preserving high productivity throughout the manufacturing process. Development of the system has benefited in part from research results from a project commissioned by Japan’s New Energy and Industrial Technology Development Organization (NEDO).
The information presented is current as of the publication date and is subject to change without notice.
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